CVD Polymers : fabrication of organic surfaces and devices by Karen K. Gleason

By Karen K. Gleason

The tactic of CVD (chemical vapor deposition) is a flexible strategy to fabricate top of the range skinny motion pictures and established surfaces within the nanometer regime from the vapor part. Already conventional for the deposition of inorganic fabrics within the semiconductor undefined, CVD has turn into the tactic of selection in lots of functions to strategy polymers in addition. This hugely scalable approach enables synthesizing high-purity, defect-free motion pictures and for systematically tuning their chemical, mechanical and actual homes. furthermore, vapor part processing is important for the deposition of insoluble fabrics together with fluoropolymers, electrically conductive polymers, and hugely crosslinked natural networks. moreover, CVD allows the coating of substrates which might another way dissolve or swell upon publicity to solvents.

The scope of the e-book encompasses CVD polymerization tactics which at once translate the chemical mechanisms of conventional polymer synthesis and natural synthesis in homogeneous drinks into heterogeneous procedures for the amendment of sturdy surfaces. The ebook is based into 4 elements, complemented via an introductory evaluate of the various approach concepts for CVD of polymeric fabrics. the 1st half at the basics of CVD polymers is via a close assurance of the fabrics chemistry of CVD polymers, together with the most synthesis mechanisms and the ensuing periods of fabrics. The 3rd half specializes in the functions of those fabrics akin to membrane amendment and machine fabrication. the ultimate half discusses the possibility of scale-up and commercialization of CVD polymers

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Limb et al. studied the deposition kinetics of the self-initiated polymerization chemistry of HFPO to form PTFE [1]. Using a barrel-type reactor with a Nichrome filament wire, HFPO was thermally decomposed over a filament temperature range of 598–808 K. 5 sccm. 8 μm h−1 is achieved at a filament temperature of 691 K. 2a, the measured deposition rate of the PTFE film as a function of filament temperature can be plotted in Arrhenius form to yield a linear relationship and from which an apparent activation energy (Ea ) of 29 kcal mol−1 is derived.

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4a shows that an Arrhenius plot of deposition rate with substrate temperature yields a positively sloped line, that is, an increase in rate with a decrease in temperature. 4 kJ mol−1 . 03), that is, highly dilute conditions, studied. This dependence is actually seen in liquid phase free radical polymerization under monomer-starved conditions in which the concentration of activated initiator radicals (primary radicals) is high enough that they prematurely terminate growing polymer chain radicals, leading to a slower growth rate [191].

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