Atomic Force Microscopy in Process Engineering. Introduction by W. Richard Bowen

By W. Richard Bowen

This is the 1st e-book to compile either the fundamental thought and confirmed procedure engineering perform of AFM. it's provided in a fashion that's available and worthy to training engineers in addition to to people who are enhancing their AFM abilities and data, and to researchers who're constructing new items and recommendations utilizing AFM.

The publication takes a rigorous and useful technique that guarantees it truly is without delay acceptable to procedure engineering difficulties. basics and strategies are concisely defined, whereas particular merits for technique engineering are sincerely outlined and illustrated. Key content material contains: particle-particle, and particle-bubble interactions; characterization of membrane surfaces; the advance of fouling resistant membranes; nanoscale pharmaceutical research; nanoengineering for mobile sensing; polymers on surfaces; micro and nanoscale rheometry.

  • Atomic strength microscopy (AFM) is a vital device for method engineers and scientists because it allows more suitable procedures and products
  • The in simple terms booklet facing the speculation and functional purposes of atomic strength microscopy in approach engineering
  • Provides best-practice assistance and event on utilizing AFM for technique and product improvement

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Additional resources for Atomic Force Microscopy in Process Engineering. Introduction to AFM for Improved Processes and Products

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Dreier, M. Rüetschi, T. M. Overney, J. -J. Güntherodt, Progress in noncontact dynamic force microscopy, J. Vac. Sci. Technol. B 12 (3) (1994) 1673–1676. [60] M. Radmacher, M. P. A. K. Hansma, Imaging adhesion forces and elasticity of lysozyme adsorbed on mica with the atomic force microscope, Langmuir 10 (1994) 3809–3814. [61] N. Chaiyut, T. Amornsakchai, S. Thanawan, Force volume imaging of defects in highly drawn high-density polyethylene, Polym. Test. 26 (2007) 396–401. [62] C. Rotsch, M. Radmacher, Mapping local electrostatic forces with the atomic force microscope, Langmuir 13 (1997) 2825–2832.

A 66 (1998) S319–S323. [48] K. -J. Eom, C. Lee, Comparison of the removal efficiency for organic contaminants on silicon wafers stored in plastic boxes between UV/O3 and ECR oxygen plasma cleaning methods, Thin Solid Films 435 (2003) 227–231. [49] E. Bonaccurso, G. Gillies, Revealing contamination on AFM cantilevers by microdrops and microbubbles, Langmuir 20 (2004) 11824–11827. [50] R. Luginbuhl, A. D. -B. M. D. Ratner, Comprehensive surface analysis of hydrophobically functionalized SFM tips, Ultramicroscopy 82 (2000) 171–179.

If this was the only force present between colloidal particles in solution, then dispersions would be unstable due to aggregation, leading to the formation of a precipitate. Fortunately, this is not the case as particles in water or any liquid of high dielectric constant usually possess charges on their surfaces. Repulsion between identically charged particles is long range in character and is often sufficient to overcome the aggregating effects of attractive van der Waals interactions. 1 The Electrical Double Layer From observations of colloidal systems, it can be concluded that particles dispersed in water or any liquid with a high dielectric constant will usually develop a surface charge.

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